論文 (Refereed Papers)

1. “A Study on Graphitization of 4H-SiC(0001) Surface under Low Pressure Oxygen Atmosphere
   　and Effects of Pre-oxidation treatment”
   Yuichi Nagahisa, Yoshishige Tsuchiya and Eisuke Tokumitsu
   Materials Science Forum，Vol. 821-823，pp. 949-952 (2015)
   論文PDF (Article PDF)
2. “High Relative Dielectric Constant Bismuth-Niobium-Oxide Films Prepared Using Nb-rich Precursor Solution”
   Tomoki Ariga, Satoshi Inoue, Shin Matsumoto, Masatoshi Onoue, Takaaki Miyasako,
   　Eisuke Tokumitsu and Tatsuya Shimoda
   Japanese Journal of Applied Physics, Vol. 54, No. 9, 091501 (2015)
   論文PDF (Article PDF)

国際学会 (International Conference)

1. “Characterization of solution processed thin film MoS₂ on oxide dielectric”
   Joonam Kim and Eisuke Tokumitsu
   The 5th International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies (EM-Nano 2015) P2-16, Niigata, Japan (Jun. 17, 2015)
   ポスター (Poster)
2. “Crystallization Mechanism and Crystallographic Orientation Control
   of (Bi,La)₄Ti₃O₁₂ (BLT) Films by Sol-gel technique”
   Eisuke Tokumitsu and Ken-ichi Haga
   13th European Meeting on Ferroelectricity (EMF 2015), Porto, Portugal, (Jun. 28 – Jul. 3, 2015)
   口頭発表 (Oral)
3. “Oxide-Channel Ferroelectric-Gate Thin Film Transistors Prepared by Solution Process”
   Eisuke Tokumitsu and Tatsuya Shimoda
   The 22nd International Display Workshop (IDW ’15) AMD 6-1, Shiga, Japan (Dec. 9-15, 2015)
   招待講演 (Invited)